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反铁电氧化铪延伸至二维极限

Science · 2026年9月24日 · Li 等 19 位作者

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一分钟了解要点单晶掺镧氧化铪薄膜在压应变下呈现反铁电性,二维极限下有序温度达850℃。结果研究者在钇稳定氧化锆衬底上生长单晶(111)取向掺镧氧化铪薄膜,观察到反平行亚晶格极化和稳定双回线,符合经典反铁电模型。

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Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia's potential for advanced antiferroelectric devices.

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